C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 235/74 (2006.01) A61K 31/16 (2006.01) A61K 31/195 (2006.01) A61K 31/215 (2006.01) A61K 31/33 (2006.01) C07C 229/18 (2006.01) C07C 229/36 (2006.01) C07C 233/56 (2006.01) C07C 323/52 (2006.01) C07C 323/63 (2006.01) C07D 207/337 (2006.01) C07D 213/56 (2006.01) C07D 309/12 (2006.01) C07D 333/24 (2006.01) C07J 41/00 (2006.01)
Patent
CA 2100817
Disclosed are compounds of formula (see formula I) wherein R is hydrogen, hydroxy, esterified hydroxy or etherified hydroxy; R1 is hydrogen, halogen, trifluoromethyl or lower alkyl; R2 is hydrogen, halogen, trifluoromethyl or lower alkyl; R3 is halogen, trifluoromethyl, lower alkyl, aryl, aryl-lower alkyl, cycloalkyl or cycloalkyl-lower alkyl; or R3 is the radical (see formula II) wherein R8 is hydrogen, lower alkyl, aryl, cycloalkyl, aryl-lower alkyl or cycloalkyl-lower alkyl; R9 is hydroxy or acyloxy; R10 represents hydrogen or lower alkyl; or R9 and R10 together represent oxo; R4 is hydrogen, halogen, trifluoromethyl or lower alkyl; X is -NR7; W is O or S; R5 and R6 together represent oxo; R7 represents hydrogen or lower alkyl; Z represents carboxyl, carboxyl derivatized as a pharmaceutically acceptable ester or as a pharmaceutically acceptable amide; and pharmaceutically acceptable salts thereof; which are useful as hypocholesteremic agents.
Main Alan Joseph
Walker Gordon Northrop
Yokoyama Naokata
Ag Ciba-Geigy
Fetherstonhaugh & Co.
Novartis Ag
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