C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/225, 260/296
C07D 213/74 (2006.01) A61K 31/44 (2006.01) C07D 213/89 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 417/12 (2006.01)
Patent
CA 2019957
There are described compounds of the formula (see formula I) where n is 0 or 1; X is Q or NR2, R2 being hydrogen, loweralkyl or loweralkyl- carbonyl; Z is NO2 or NHR where R is hydrogen, loweralkyl, arylloweralkyl or loweralkylcarbonyl; and R1 is (see formula II, III, IV, V, VI, or VII) (see formula VIII, IX, X, XI, XII, or XIII) wherein R3 is hydrogen, loweralkyl or loweralkylcarbonyl; m is 1 or 2; each R4 is independently hydrogen or loweralkyl; and Y is hydrogen, halogen, loweralkyl, loweralkoxy or trifluoromethyl; which compounds are useful as topical antiinflammatory agents for the treatment of various dermatoses.
Davis Larry
Effland Richard Charles
Freed Brian Scott
Hamer Russell Richard Lee
Klein Joseph Thomas
Aventis Pharmaceuticals Inc.
Bereskin & Parr
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