C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/208, 260/325
C07D 207/16 (2006.01) A61K 31/535 (2006.01) C07C 319/02 (2006.01) C07C 331/10 (2006.01) C07D 295/185 (2006.01) C07D 295/192 (2006.01) C07C 323/20 (2006.01) C07C 323/52 (2006.01)
Patent
CA 1277663
ABSTRACT The compounds of this invention are heterocyclic amides represented by the formula: Image wherein: R1 and R2 are the same or different members of the group consisting of halo, phenyl, substituted phenyl and a Image group wherein q, r and t are independently an integer of from 1 to 8 provided that q + r + t is equal to or less than 10; Y is thio, sulfinyl or sulfonyl; Alk is straight or branched chain lower alkylene, and R3 is a heterocyclic amine represented by the formula: Image wherein R4 is selected from the group consisting of hydrogen, lower alkyl, phenyl, substituted phenyl, benzyl, substituted benzyl, carboxyl or carboxyloweralkyl; X is selected from the group consisting of N-R4, O and CH2; m is 2 or 3; n is 2 or 3 when X is O or N-R4, and n is 1 to 3 when X is CH2; p is 0 to 2; and the pharmaceutically acceptable salts thereof. The compounds are anti-inflammatory and anti-allergy agents.
500836
Mueller Richard A.
Partis Richard A.
Mueller Richard A.
Osler Hoskin & Harcourt Llp
Partis Richard A.
Searle (g. D.) & Co.
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