C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 211/29 (2006.01) C07C 215/08 (2006.01) C07C 217/58 (2006.01) C07C 229/36 (2006.01) C07C 229/38 (2006.01) C07C 233/09 (2006.01) C07C 233/13 (2006.01) C07C 233/18 (2006.01) C07C 233/56 (2006.01) C07C 233/60 (2006.01) C07C 233/66 (2006.01) C07C 233/73 (2006.01) C07C 233/78 (2006.01) C07C 235/20 (2006.01) C07C 235/34 (2006.01)
Patent
CA 2630227
Compounds of formula (Ia) and (Ib) wherein A, B, C and R1 are described herein. The compounds (Ia) and (Ib) are useful as CETP inhibitors.
La présente invention concerne des composés de formules (Ia) et (Ib) dans lesquelles A, B, C et R1 ont les correspondances indiquées dans l'invention.
Chen Bang-Chi
Finlay Heather
Harikrishnan Lalgudi S.
Jiang Ji
Johnson James A.
Bristol-Myers Squibb Company
Gowling Lafleur Henderson Llp
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