C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/04 (2006.01) C07D 413/04 (2006.01) C07F 9/6558 (2006.01) C07H 7/06 (2006.01) C07H 21/04 (2006.01) C07J 51/00 (2006.01) C12Q 1/68 (2006.01)
Patent
CA 2265727
The present invention pertains to compounds of general formula (I), where R1 to R7 have the notations given in the application, as well as preparation thereof. Compounds can be used as substrates for RNA and DNA polymerases and consequently incorporated to RNA our DNA oligonucleotides, including for the purpose of labelling and isolating nucleic acids and DNA sequencing.
La présente invention porte sur des composés de formule générale (I), où les résidus R¿1? à R¿7? ont les significations indiquées dans la demande, ainsi que sur le mode de préparation. Les composés se prêtent notamment pour servir de substrats à des polymérases de l'ARN et de l'ADN et sont donc intégrables dans des oligonucléotides de l'ARN ou de l'ADN, notamment pour le marquage et la mise en évidence d'acides nucléiques et pour le séquençage de l'ADN.
Muhlegger Klaus
von Der Eltz Herbert
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Roche Diagnostics Gmbh
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