C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/04 (2006.01) A61K 31/44 (2006.01) A61K 31/505 (2006.01) A61K 31/53 (2006.01) A61K 31/695 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2077732
ABSTRACT OF THE DISCLOSURE Compounds of the formula: Image wherein R1 is aryl which may have suitable substituent(s) or heterocyclic group which may have suitable substituent(s), R2 is aryl which may have suitable substituent(s) or heterocyclic group which may have suitable substituent(s), and Y is a bivalent radical selected from Image , Image , Image , Image and Image (in which Image means single bond or double bond), each of which may have suitable substituent(s), and pharmaceutically acceptable salts thereof. These compounds are useful for the prophylactic and therapeutic treatment of IL-1 and TNF mediated diseases such as chronic inflammatory diseases, specific autoimmune diseases, sepsis- induced organ injury in humans and animals. The preparation of these compounds, pharmaceutical compositions containing them and prophylactic and therapeutic treatments are also disclosed.
Abe Yoshito
Kawai Yoshio
Marusawa Hiroshi
Oku Teruo
Tanaka Hirokazu
Abe Yoshito
Fujisawa Pharmaceutical Co. Ltd.
Kawai Yoshio
Marusawa Hiroshi
Oku Teruo
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