C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/435 (2006.01)
Patent
CA 2088220
ABSTRACT OF THE DISCLOSURE Compounds of the formula: Image wherein R1 is hydrogen, halogen, nitro, lower alkyl, lower alkoxy, amino or acylamino, R2, R3 and R4 are each hydrogen, halogen, nitro, cyano, lower alkyl, lower alkenyl, lower alkylthio, mono or di or trihalo(lower)alkyl, oxo(lower)alkyl, hydroxy(lower)alkyl or optionally esterified carboxy; or R2 and R3 are linked together to form 1,3-butadienylene, R5 is hydrogen or imino-protective group, R6 and R7 are each hydrogen or lower alkyl, R8 is hydrogen or lower alkyl which may have a substituent selected from the group consisting of halogen and lower alkoxy, A is lower alkylene, Q is CH or N, X is N or CH, Y is NH, O or S, and Z is NH, S, SO2 or O. and pharmaceutically acceptable salts thereof. The preparation of these compounds, pharmaceutical compositions containing them and the treatment or prevention of angiotensin II mediated diseases using these compounds are also disclosed.
Inoue Takayuki
Kayakiri Hiroshi
Kuroda Akio
Oku Teruo
Satoh Shigeki
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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