C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 498/04 (2006.01) A61K 31/436 (2006.01) C07D 498/18 (2006.01) C07H 19/01 (2006.01)
Patent
CA 2176961
A compound of structure (I), wherein R and R1 are each, independently, (a) or hydrogen; R2 is a heterocyclic radical which may be optionally substituted; n = 0-6; with the proviso that R and R1 are both not hydrogen, or a pharmaceutically acceptable salt thereof which is useful as an immunosuppressive, antiinflammatory, antifungal, antiproliferative, and antitumor agent.
Composé de la structure (I), dans laquelle R et R?1¿ représentent chacun indépendamment (a) ou hydrogène, R?2¿ représente un radical hétérocyclique éventuellement substitué, n = 0-6, à condition que R et R?1¿ ne représentent pas tous deux hydrogène; ou sel pharmaceutiquement acceptable de ce composé, ce sel ou ce composé pouvant être utilisé comme agent immunosuppresseur, anti-inflammatoire, antifongique, antiprolifération et antitumoral.
Nelson Frances C.
Schiehser Guy A.
Torys Llp
Wyeth
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