Heterotricyclic derivatives and process for preparing the same

Details Heterotricyclic derivatives and process for preparing the same Heterotricyclic derivatives and process for preparing the same

C - Chemistry, Metallurgy

07

D

260/271.3, 260/2

C07D 471/04 (2006.01) C07D 241/44 (2006.01) C07D 487/04 (2006.01) C07D 498/04 (2006.01)

Patent

CA 1131633

ABSTRACT OF THE DISCLOSURE: The invention is concerned with new compounds of the general formula (I): Image (I) wherein A represents a nitrogen atom or a group of formula -CH-; G represents an oxygen atom -O- or a group of formula Image or Image (in which Z represents a hydrogen atom, an alkyl radical containing from 1 to 5 carbon atoms or, together with Y a carbon-nitrogen or carbon-carbon bond and Z' represents a hydrogen or haloqen atom); Y repeesents a hydrogen atom or, together with Z when G represents a group of formula Image or Image , a carbon-nitrogen or carbon-carbon bond, or, together with X, a keto group; X sepresents a hydrogen atom or, together with Y, a keto group; R represents a hydroxymethyl, formyl, tetrazol-5-yl, N-(tetrazol-5-yl)carbamoyl, aminomethyl or carbamoyl radical; and R1represents a hydrogen or halogen atom or an alkoxy radical containing from 1 to 5 carbom atoms; and pharmaceutically acceptable acid addition salts thereof as well as a process for their preparation. The compounds of the invention have anti-allergic activity.

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