C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 493/04 (2006.01) A61K 8/64 (2006.01) A61K 31/495 (2006.01) A61Q 19/02 (2006.01)
Patent
CA 2052082
A hexitol derivative represented by formula (I) Image (I) wherein R represents hydrogen, unsubstituted or lower alkyl- substituted cycloalkyl, lower alkenyl, lower alkoxy, lower alkanoyl, piperidyl or Image wherein each of m and n independently represents an integer of 0 to 3; each of X, Y and Z independently represents hydrogen, lower alkyl, lower alkoxy, lower alkanoyl, lower alkanoyloxy, hydroxyl, halogen or nitro or a pharmaceutically acceptable salt thereof.
Hayashi Hiroaki
Ikeda Junichi
Kubo Kazuhiro
Suzuki Fumio
Goudreau Gage Dubuc
Kyowa Hakko Kogyo Co. Ltd.
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