Hf- plasma source with plurality of out-of-phase electrodes

Details Hf- plasma source with plurality of out-of-phase electrodes Hf- plasma source with plurality of out-of-phase electrodes

H - Electricity

01

J

H01J 37/32 (2006.01)

Patent

CA 2606864

A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes out of phase with one another, it is possible to improve the characteristics of the plasma generated.

L'invention concerne une source de plasma. Ladite source comprend un élément à impédance réactive formé d'une pluralité d'électrodes. L'utilisation d'une pluralité d'électrodes et l'alimentation des électrodes adjacentes hors phase les unes avec les autres permettent d'améliorer les caractéristiques du plasma généré.

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