High absorbance/low reflectance felts with a pattern layer

D - Textiles – Paper – 21 – F

Patent

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Details

D21F 7/08 (2006.01) D21F 1/00 (2006.01) D21F 11/00 (2006.01)

Patent

CA 2252651

An apparatus (10) for making paper. The apparatus (10) comprises a felt (14) and a pattern layer (18) joined to the felt (14). The felt (14) has a relatively high UV absorbance. Such a high UV absorbance prevents the actinic radiation applied to cure the pattern layer (18) from scattering when the radiation penetrates the surface of the pattern layer (18). By limiting the scattering of radiation beneath the surface of the pattern layer (18), extraneous cured pattern layer material is minimized in the regions of the felt (14) where it is desired not to have pattern layer material.

On décrit un appareil destiné à fabriquer du papier, lequel comprend un feutre et une couche à motifs unie au feutre. Le feutre présente un pouvoir absorbant aux UV relativement élevé. Ce pouvoir absorbant relativemenet élevé empêche le rayonnement actinique appliqué pour durcir la couche à motifs de se disperser au moment où ce rayonnement pénètre la surface de la couche à motifs. En limitant la dispersion du rayonnement sous la surface de la couche à motifs, on réduit la présence de matériau durci de formation de couche à motifs dans les zones du feutre que l'on désire maintenir exemptes de celui-ci.

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