C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/83 (2006.01) C11D 1/52 (2006.01) C11D 1/72 (2006.01) C11D 1/835 (2006.01) C11D 1/86 (2006.01) C11D 1/94 (2006.01) C11D 1/02 (2006.01) C11D 1/29 (2006.01) C11D 1/66 (2006.01) C11D 1/90 (2006.01)
Patent
CA 2126268
Concentrated high actives cleaning compositions are prepared which exhibit excellent cleaning performance, dispersibility and homogeneity in solution. The compositions of the present invention include a nonionic surfactant such as fatty alcohol ethoxylates, alkyl phenol ethoxylates and alkyl polyglycosides and an amide cosurfactant such as fatty acid dialkanolamides. Optional ingredients can be included such as a secondary surfactant, a pH control agent, a hydrotrope, dyes, fragrances, preservatives, denaturing agents and the like. In one preferred embodiment, the high actives cleaning composition is used as a detergent base. A method is also disclosed for use of a detergent base. In another preferred embodiment, the concentrated cleaning composition is diluted by the end user to a desired strength for specific cleaning purposes. A method is also disclosed for use of the concentrated cleaning composition.
Amway Corporation
Kirby Eades Gale Baker
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