High aspect ratio, flexible thick film positive photoresist

Details High aspect ratio, flexible thick film positive photoresist High aspect ratio, flexible thick film positive photoresist

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/023 (2006.01) G03F 7/16 (2006.01) G03F 7/30 (2006.01)

Patent

CA 2097791

HIGH ASPECT RATIO, FLEXIBLE THICK FILM POSITIVE PHOTORESIST Abstract of the Disclosure A crack resistant thick film positive photoresist having a thickness of from greater than 5µ to 100µ is coated as a single layer on a substrate to provide a relief structure thereon having vias in which the sidewalls are substantially vertical. The photoresist composition comprises a novolac resin, a photosensitizer, and a copolymer of an alkyl vinyl ether and an unsaturated dicarboxylic acid, ester or anhydride thereof.

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