High concentration sodium permanganate etch bath and its use...

Details High concentration sodium permanganate etch bath and its use... High concentration sodium permanganate etch bath and its use...

C - Chemistry, Metallurgy

09

K

149/24

C09K 13/12 (2006.01) C08J 7/12 (2006.01) C23C 18/22 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1254493

ABSTRACT OF THE DISCLOSURE An a? alkaline liquid solution is disclosed consisting essentially of water, at least about 75 grams/ liter of NaMnO4 and NaOH in an amount sufficient so that removal of substantially all of the manganese residues from the surface of a material contacted with the solution can be accomplished by acid neutralization only. The solution disclosed is useful for preparing resinous substrates for metallization.

504649

Affiliated with

Also associated with

Rating

High concentration sodium permanganate etch bath and its use... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High concentration sodium permanganate etch bath and its use..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High concentration sodium permanganate etch bath and its use... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1317633