High contrast, high resolution deep ultraviolet lithographic...

Details High contrast, high resolution deep ultraviolet lithographic... High contrast, high resolution deep ultraviolet lithographic...

G - Physics

03

C

96/161

G03C 1/54 (2006.01) G03F 7/016 (2006.01)

Patent

CA 1221864

HIGH-CONTRAST, HIGH RESOLUTION DEEP ULTRAVIOLET LITHOGRAPHIC RESISTS Abstract of the Disclosure A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.

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