G - Physics – 03 – F
Patent
G - Physics
03
F
96/269
G03F 7/26 (2006.01) G03F 7/32 (2006.01)
Patent
CA 1306138
ABSTRACT HIGH CONTRAST LOW METAL ION PHOTORESIST DEVELOPING METHOD AND COMPOSITION A novel low metal ion developer composition used in a two step process which provides high contrast images and long developer bath life is provided. The process gives high contrast images. The substrate coated with positive photoresist is exposed then immersed in a "predip" bath, rinsed, and then, immersed in the developer bath, rinsed and dried. This process provides high contrast which does not decrease over the life of the developer system. The system consists of 1) a predip solution containing aqueous non-metal ion organic base and a cationic surfactant adjusted to a concentration that does not give development, and 2) a developer solution containing an aqueous solution of an non-metal ion organic base and a flourochemical surfactant adjusted to a concentration that provides development. The high contrast is achieved by the cationic surfactant coating the resist and inhibiting the attack on the unexposed resist by the developer while permitting the developer to dissolve away the exposed resist.
527683
Blakeney Andrew J.
Lewis James M.
Blakeney Andrew J.
Gowling Lafleur Henderson Llp
Huls America Inc.
Lewis James M.
Microsi Inc.
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