High contrast photoresist developer

Details High contrast photoresist developer High contrast photoresist developer

G - Physics

03

C

96/63

G03C 5/50 (2006.01) G03F 7/32 (2006.01)

Patent

CA 1265373

ABSTRACT HIGH CONTRAST PHOTORESIST DEVELOPER A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photo- resist. The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a carboxylated surfactant. The incorporation of the car- boxylated surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the carboxylated surfactant increases the gamma from a typi- cal photoresist gamma (.gamma.) of 3 or less to a gamma greater than 5. The high contrast photoresist provides linewidth control and affords improved process latitude in photo- resist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps of topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist. The process latitude afforded by the high contrast is a result of the ability to over develop (develop longer) the exposed resist without affecting the unexposed resist in the adjacent areas.

492736

Affiliated with

Also associated with

Rating

High contrast photoresist developer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High contrast photoresist developer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High contrast photoresist developer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1286145