High density silicon oxynitride

Details High density silicon oxynitride High density silicon oxynitride

C - Chemistry, Metallurgy

04

B

261/1, 25/128

C04B 35/58 (2006.01) C04B 35/591 (2006.01)

Patent

CA 1161067

ABSTRACT A reaction bonded silicon oxynitride product having a density of 85 to 95% of theoretical density, a degree of density heretofore not attainable by sintering or reaction bonding. Such high densities are attained by nitriding, in an oxygen free atmosphere ultra fine silicon and ultra fine silica in the presence of certain reaction aids. The particle size of the silicon powder must be at least as fine as about 3 microns and the silica as fine as about 0.3 microns.

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