High-efficiency chromium plating bath with alkyl sulfonic...

Details High-efficiency chromium plating bath with alkyl sulfonic... High-efficiency chromium plating bath with alkyl sulfonic...

C - Chemistry, Metallurgy

25

D

204/35

C25D 3/10 (2006.01)

Patent

CA 1292093

24133-536 CHROMIUM PLATING BATH FOR PRODUCING NON-IRIDESCENT, ADHERENT, BRIGHT CHROMIUM DEPOSITS AT HIGH EFFICIENCIES AND SUBSTANTIALLY FREE OF CATHODIC LOW CURRENT DENSITY ETCHING ABSTRACT A chromium plating bath and process for producing a non-iridescent, adherent, bright chromium deposit at high effi- ciencies and high temperatures under conditions such that the process is substantially free of cathodic low current density etching. The bath consists essentially of chromic acid and sulfate in predetermined concentrations, and an organic sulfonic acid or salts thereof, e.g. methyl, ethyl and propyl sulfonic acid, and methane and 1,2-ethane disulfonic acid wherein the sulphonic acid ratio of S to C is ? 1/3. The bath is substan- tially free of carboxylic acid, phosphonic acids, perfluorolower- alkyl sulfonic acids, and halides.

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