High frequency plasma beam source

Details High frequency plasma beam source High frequency plasma beam source

H - Electricity

05

H

H05H 1/46 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2401220

The invention relates to a high frequency plasma source, comprising a support element, on which a magnetic field coil arrangement (4), a gas distribution system (6) and a unit for extraction of a plasma beam are arranged. Additionally a high frequency matching network (2) is arranged within the plasma source.

L'invention concerne une source de plasma haute fréquence avec un élément support (1) sur lequel sont disposés un système de bobines de champ magnétique (4), un système de distribution du gaz (6) et une unité permettant d'extraire un jet plasma (5). Il est en outre prévu à l'intérieur de la source de plasma un réseau à quatre fils haute fréquence (2).

Affiliated with

Also associated with

Rating

High frequency plasma beam source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High frequency plasma beam source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High frequency plasma beam source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1611684