C - Chemistry – Metallurgy – 01 – G
Patent
C - Chemistry, Metallurgy
01
G
23/222
C01G 27/00 (2006.01) C01B 21/076 (2006.01) C23C 14/06 (2006.01)
Patent
CA 1211920
HIGH HARDNESS HAFNIUM NITRIDE ABSTRACT A high hardness hafnium nitride formed by a reac- tive sputter coating of a substrate in a closed chamber with a substantially pure hafnium target, and an atmos- phere of argon and nitrogen. The hafnium nitride has a face centered cubic structure with a lattice spacing of 4.55 to 4.58A°, and a hardness in the range of 2700 to 5500 kilograms per square millimeter utilizing a Vickers microindentation hardness test.
449001
Borg-Warner Corporation
Macrae & Co.
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