High intensity x-ray beam system

Details High intensity x-ray beam system High intensity x-ray beam system

G - Physics

21

K

G21K 1/06 (2006.01)

Patent

CA 2725521

An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

L'invention concerne un système optique à rayons x destiné à la production de faisceaux de rayons x à haute intensité. Le système est muni d'une optique avec une surface formée en faisant tourner un contour défini autour d'un axe de rotation qui est différent de l'axe symétrique géométrique de l'optique. En conséquence, le système peut utiliser une source qui possède un profil d'émission circulaire ou une source de grande taille, pour fournir un flux accru à un échantillon.

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