C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/174
C23C 16/50 (2006.01) C23C 14/32 (2006.01) H01J 37/32 (2006.01)
Patent
CA 1197493
ABSTRACT OF THE DISCLOSURE An apparatus for deposition of coatings upon sub- strates generates a non-local thermal equilibrium arc plasma at the relatively high pressure of at least approximately 1 atmosphere. A closed chamber is defined by a cylindrical anode and annular housings carrying transparent end plates. A pencil-shaped cathode is passed through. one of the end plates coaxially into the chamber so that its tapered end is spatially proximate to an exit orifice centrally located in the anode. Gas ports permit the introduction of a preselected gaseous environment at the desired pressure into the chamber. A low- current arc is struck between the anode and the cathode estab- lishing the desired plasma. Two coils are coaxially placed radially outward of both ends of the chamber in a Helmholtz coil configuration to generate a uniform magnetic filed in the chamber and induce rotation of the arc plasma. The coating material is introduced into the plasma as by a reservoir in the cathode and its excited species ejected through the exit orifice in a plasma jet for deposition upon any substrate adjacent thereto.
431456
Gowling Lafleur Henderson Llp
The Standard Oil Company
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