High purity doping alloys

B - Operations – Transporting – 01 – J

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117/48.2

B01J 13/04 (2006.01) B01J 2/00 (2006.01) B01J 2/16 (2006.01) C23C 16/24 (2006.01) C23C 16/442 (2006.01) C23C 26/00 (2006.01)

Patent

CA 1309308

Abstract of the Disclosure HIGH PURITY DOPING ALLOYS Particles of silicon and a p or n carrier substance which are in spherical or spheroidal form, and suitable for use in the preparation of doped semiconductor devices, can be prepared by a fluidized bed technique for chemical vapor deposition of a carrier substance (B, P, As or Sb). The prepared products have a kernel of high purity poly- silicon and a layer of silicon/dopant alloy upon the kernel. Optionally, the particles have a thin outer layer of silicon.

584183

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

High purity doping alloys does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High purity doping alloys, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High purity doping alloys will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1198510

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.