High rate sputtering of exhaust oxygen sensor electrode

Details High rate sputtering of exhaust oxygen sensor electrode High rate sputtering of exhaust oxygen sensor electrode

C - Chemistry, Metallurgy

23

C

204/96.08

C23C 14/34 (2006.01) H01J 37/34 (2006.01)

Patent

CA 1240952

HIGH RATE SPUTTERING OF EXHAUST OXYGEN SENSOR ELECTRODE Abstract of the Disclosure: A method of sputtering a platinum exhaust gas electrode onto a vitrified zirconia thimble for an electrochemical-type exhaust gas oxygen sensor. Porous high surface area films are consistently deposited at high rates. A DC magnetron cathode assembly having a magnetic field strength of at least 500 gauss across its target face is used at a sputtering power of about 4 - 9 kilowatts. A thimble-target spacing of less than about 3.0 cm, a pressure less than about 10 millitorr, a sputtering atmosphere consisting essentially of more than about 50 percent nitrogen and/or oxygen, an electrically isolated deposition surface, and an electrically floating reference electrode precoated on the zirconia thimble surface are used.

482058

Affiliated with

Also associated with

Rating

High rate sputtering of exhaust oxygen sensor electrode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High rate sputtering of exhaust oxygen sensor electrode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High rate sputtering of exhaust oxygen sensor electrode will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1240336