High resolution alignment technique and apparatus

Details High resolution alignment technique and apparatus High resolution alignment technique and apparatus

G - Physics

01

B

33/49

G01B 9/021 (2006.01) G03F 9/00 (2006.01)

Patent

CA 1119396

75E166 HIGH RESOLUTION ALIGNMENT TECHNIQUE AND APPARATUS ABSTRACT OF THE DISCLOSURE There is provided a technique and apparatus for aligning a mask to a substrate with high precision using Moire fringe effects produced by superimposing diffraction gratings. The gratings comprise first and second patterns of horizontal and vertical lines and spaces, respectively. The first pattern comprises horizontal and vertical lines and spaces of a first width. The second pattern comprises horizontal and vertical lines of a second width which differs from the lines in the first pattern by a small amount .DELTA. . The patterns are superimposed to provide a Moire fringe effect. When alignment occurs, a symmetrical pattern is provided. If misalignment in the X, Y or .theta. coordinate occurs, an assymmetrical or skewed pattern of Moire fringe effects is generated.

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