G - Physics – 03 – G
Patent
G - Physics
03
G
314/8
G03G 13/00 (2006.01) G03F 7/20 (2006.01) G03G 15/00 (2006.01) H01S 3/30 (2006.01)
Patent
CA 1173889
HIGH RESOLUTION OPTICAL LITHOGRAPHY METHOD AND APPARATUS HAVING EXCIMER LASER LIGHT SOURCE AND STIMULATED RAMAN SHIFTING Abstract An optical lithography method and apparatus in which a pulsed excimer laser produces at least one fundamental output which is directed to expose a photosensitive medium. The output is highly non-gaussian and has sufficient power so that full exposures can be accomplished within a few seconds. An alternate light source is provided by directing the excimer laser output to a Raman cell having a suitable Raman medium contained therein. At least one secondary wavelength is produced by stimulated Raman scattering and the output of the Raman cell is directed to expose a photosensitive medium. A mixture of more than one excimer gas can also be provided in the excimer laser to produce one fundamental output for each excimer gas present in the mixture. These outputs can be directed to expose a photosensitive medium directly. Alternatively, these outputs can be directed to a Raman cell having either a single Raman medium or multiple Raman media in a suitable mixture and directing the output from the Raman cell to expose the photosensitive medium. SA9-81-008
399143
Jain Kantilal
Willson Carlton G.
International Business Machines Corporation
Rosen Arnold
LandOfFree
High resolution optical lithography method and apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High resolution optical lithography method and apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High resolution optical lithography method and apparatus... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1327470