High resolution positive acting dry film photoresist

Details High resolution positive acting dry film photoresist High resolution positive acting dry film photoresist

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/032 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2224312

A positive acting photoresist composition (e.g., a monolayer dry film) which is strippable in aqueous alkaline solution comprises a photo acid generator and a UV-transparent resin binder system which allows efficient photo bleaching of the photoactive component. An acid functional cellulosic resin may be the only binder resin, an acidic acrylate resin being optional. The dry coating is flexible and may be used as an etch and plating resist.

Composition de résine photosensible positive (par ex., un film sec monomoléculaire), décollable dans une solution alcaline aqueuse, qui comprend un générateur d'acide photographique et un liant de résine transparent au rayonnement ultraviolet qui permet le blanchiment photographique efficace du composant photosensible. Une résine cellulosique fonctionnelle acide peut être la seule résine liante, et une résine acrylique acide est facultative. La couche sèche est souple et peut être utilisée comme résine de gravure et de revêtement.

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