High resolution two-layer resists

Details High resolution two-layer resists High resolution two-layer resists

H - Electricity

01

L

356/177

H01L 21/308 (2006.01) G03F 7/039 (2006.01) G03F 7/095 (2006.01) H01L 29/06 (2006.01)

Patent

CA 1155238

HOWARD, R. E. 1-3-3 16. HIGH RESOLUTION TWO-LAYER RESISTS Abstract This invention relates to the use of two-layer resist composite, with a more sensitive and thicker resist being the lower layer, in the production of devices requiring highly resolved features. The improvement re- sides in selecting the sensitivity of the resist material of the upper layer and its thickness such as to allow, upon exposure of the composite to a dose of energy and removal of the exposed portions, production in the surface of the upper layer of apertures with a resolution of 5000 .ANG. (500 nanometers) or less, the thickness of the lower layer being selected to be sufficient to at least reduce adverse effects of said exposure upon the said resolution.

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