High sensitivity photopolymerizable compositions containing...

Details High sensitivity photopolymerizable compositions containing... High sensitivity photopolymerizable compositions containing...

G - Physics

03

F

96/169

G03F 7/031 (2006.01) G03F 7/027 (2006.01) G03F 7/029 (2006.01)

Patent

CA 2015894

43847CAN1A ABSTRACT OF THE DISCLOSURE The invention provides sensitivity increases in high light sensitivity free radical photopolymerization reactions. Compositions based on ethylenically unsaturated monomers or oligomers and photoinitiators selected from iodonium salts and halotriazines show higher speeds by the addition of hydrogen donating mercapto compounds. The compositions are valuable in negative-acting photopoly- merizable compositions such as high speed printing plates.

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