High spatial resolution ellipsometry device

Details High spatial resolution ellipsometry device High spatial resolution ellipsometry device

G - Physics

01

J

G01J 3/447 (2006.01) G01N 21/21 (2006.01)

Patent

CA 2224999

An ellipsometry device includes first focusing means (L1), combined with a first optical system (10), for focusing the light beam from said first optical system (10) onto the sample, second focusing means (L2), combined with a second optical system, for focusing the beam reflected by the sample surface onto the input of the second optical system, and optical correction means (PT) for correcting, together with the first and second focusing means (L1, L2), the position of the focused reflected beam so as to reject the interference reflections generated by the surface of the sample opposite the light beam receiving surface, and to obtain a maximum signal level at the photodetector (7).

Le dispositif d'ellipsométrie comprend des premiers moyens de focalisation (L1) associés à un premier système optique (10) et propres à focaliser le faisceau d'illumination issu dudit premier système optique (10) sur l'échantillon, des seconds moyens de focalisation (L2) associés à un second système optique et propres à focaliser le faisceau réfléchi par la surface de l'échantillon sur l'entrée du second système optique, et des moyens de correction optique (PT) propres, en association avec les premiers et seconds moyens de focalisation (L1 et L2), à corriger la position du faisceau réfléchi focalisé pour obtenir la réjection des réflexions parasites engendrées par la face de l'échantillon opposée à celle recevant le faisceau d'illumination, et pour obtenir le maximum de signal au niveau du protodétecteur (7).

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