High speed reticle change system

Details High speed reticle change system High speed reticle change system

H - Electricity

01

L

356/192, 356/195

H01L 21/027 (2006.01) G03F 7/20 (2006.01) H01L 21/677 (2006.01)

Patent

CA 1277443

ABSTRACT OF THE DISCLOSURE In the method of serially exposing each of a plurality of semiconductor wafers with three reticles, the first reticle having a substantially longer exposure period than the second or third reticles, the improvement comprises: exposing each wafer with one of the second and third reticles; next exposing the wafer with the first reticle; next exposing the wafer with the other of the second and third reticles; and first exposing the subsequent wafer with the other reticle.

550965

Affiliated with

Also associated with

Rating

High speed reticle change system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High speed reticle change system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High speed reticle change system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1310238