C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
402/2, 260/467.2
C07C 271/06 (2006.01) C07C 333/04 (2006.01) C07D 251/34 (2006.01) C07D 493/10 (2006.01) C08F 212/04 (2006.01) C08F 212/14 (2006.01) C08F 212/34 (2006.01) C09D 125/18 (2006.01) G02B 1/04 (2006.01) G11B 7/253 (2006.01)
Patent
CA 2011075
- 1 - ABSTRACT OF THE DISCLOSURE The present invention relates to a high surface hardness transparent resin having excellent scratch resistance, heat resistance and chemical resistance, a glazing material, a protective cover for display devices, an optical lens and a hard coat material comprising the aforesaid resin, and a novel polymerizable monomer which is useful as a raw material of the above-mentioned resin. The monomer is represented by the formula (I) Image (I) (wherein R is an aliphatic residue having or not having an halogen atom, an oxygen atom, an alicyclic ring, a hetero- cyclic ring or an aromatic ring, an alicyclic residue, or a heterocyclic residue, n is an integer of 1 to 4, when n = 1, X is oxygen or sulfur, when n? 2, X's are all oxygen or all sulfur, one X is oxygen while the other X or X's are sulfur, one X is sulfur while the other X or X's are oxygen, or two X's are oxygen while the other X's are sulfur). - 2 - The aforsaid high surface hardness transparent resin comprises a crosslinked polymer prepared by copolymerizing a monomer (A) represented by the formula (I) and a monomer (B) having, in one molecule, m functional groups of at least one kind selected from the group consisting of CH2=CH-C(O)-O-, CH2=C(CH3)-C(O)-O- and CH2=CH Image where (n+m) is an integer of 3 or more.
Imai Masao
Kanemura Yoshinobu
Sasagawa Katsuyoshi
Suzuki Toshiyuki
Mitsui Toatsu Chemicals Inc.
Sim & Mcburney
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