C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
402/2, 260/467.2
C07C 271/06 (2006.01) C07C 333/04 (2006.01) C07D 251/34 (2006.01) C07D 493/10 (2006.01) C08F 212/14 (2006.01) C08F 212/34 (2006.01) C09D 125/18 (2006.01) G02B 1/04 (2006.01) G11B 7/253 (2006.01)
Patent
CA 2011074
- 1 - ABSTRACT OF THE DISCLOSURE The present invention relates to a transparent resin which has a high surface hardness and which is excellent in scratch resistance, heat resistance and chemical resistance, a glazing material, a protective cover for display devices, an optical lens and a hard coat material comprising the above-mentioned resin, and a novel polymerizable monomer represented by the formula (I) useful as a raw material for the high surface hardness transparent resin. Image (I) wherein R is an aliphatic residue having or not having an oxygen atom, an alicyclic ring, a heterocyclic ring or an aromatic ring, or an alicyclic residue, ? is 0 or 1, each of i and j is an integer of 1 or more, and when ?=0, i=j=1, when ?=1, (i+j) is 4 or less, when j=1, X is oxygen or sulfur, when j?2, all X's are oxygen or sulfur, or one X is oxygen and the other X's are sulfur, or one X is sulfur and the other X's are oxygen. The high surface hardness transparent resin comprises a crosslinked polymer prepared by copolymerizing a monomer (A) represented by the formula (I) as above and a monomer (B) - 2 - containing one or more functional groups of at least one kind selected from the group consisting of CH2=CH-C(O)-O-, CH2=C(CH3)-C(O)-O- and CH2=CH Image .
Imai Masao
Kanemura Yoshinobu
Sasagawa Katsuyoshi
Suzuki Toshiyuki
Mitsui Toatsu Chemicals Inc.
Sim & Mcburney
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