High temperature furnace for integrated circuit manufacture

Details High temperature furnace for integrated circuit manufacture High temperature furnace for integrated circuit manufacture

H - Electricity

01

L

356/187

H01L 21/02 (2006.01) C23C 16/40 (2006.01)

Patent

CA 1239230

HIGH TEMPERATURE FURNACE FOR INTEGRATED CIRCUIT MANUFACTURE Abstract of the Disclosure A high temperature furnace including a furnace chamber maintained at an internal temperature above the ignition temperature of a gas mixture used for the growth of oxide layers on silicon substrates therein. A separate burn chamber is used to mix and burn the gas mixture. A tube conveys the mixture into the furnace chamber so that ignition of the gas mixture in the furnace chamber creates a flame front that travels back along the tube to the burn chamber to sustain ignition therein. - i -

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