High-temperature resistant, selectively developable...

Details High-temperature resistant, selectively developable... High-temperature resistant, selectively developable...

G - Physics

03

F

96/150

G03F 7/26 (2006.01) G03F 7/023 (2006.01)

Patent

CA 1254432

-0- HIGH-TEMPERATURE RESISTANT, SELECTIVELY DEVELOPABLE POSITIVE-WORKING RESIST Abstract There is disclosed a positive-working resist comprising a radiation-sensitive sensitizer that pro- duces decomposition products more soluble in a selected solvent than the sensitizer, and a polymeric binder. The resist is improved in that the binder has a rigid heterocyclic ring structure comprising a por- tion of the polymer backbone so that the resist has improved a) developer selectivity and b) high tempera- ture resistance.

494087

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