C - Chemistry – Metallurgy – 23 – G
Patent
C - Chemistry, Metallurgy
23
G
C23G 1/00 (2006.01) B01J 19/00 (2006.01) C11D 11/00 (2006.01) C22B 3/00 (2006.01) C23F 1/44 (2006.01) C23G 1/10 (2006.01) G01N 33/20 (2006.01)
Patent
CA 2356601
A liquid chemical stripping or cleaning solution is selected by combinatorial high throughput screening. A high throughput screening well array assembly (10) includes (A) a metal substrate and (B) a mask (16) that defines an array of wells on the substrate. A combinatorial high throughput screening system includes (A) a metal substrate and (B) a mask (16) that defines an array of wells on the substrate and a reaction vessel to receive the well array assembly (10).
La présente concerne une solution chimique de décapage ou de nettoyage liquide sélectionnée par criblage à débit élevé combinatoire. Un réseau de puits de criblage à débit élevé (10) comprend (A) un substrat métallique et (B) un masque (16) qui définit un réseau de puits sur le substrat. Un système de criblage à débit élevé combinatoire comprend (A) un substrat métallique et (B) un masque (16) qui définit un réseau de puits sur le substrat et une cuve de réaction destinée à recevoir le réseau de puits (10).
Carnahan James C.
Lagraff John R.
Ruud James A.
Sun Xiao-Dong
Company General Electric
Craig Wilson And Company
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