C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 15/01 (2006.01) C01B 15/013 (2006.01) C01B 15/029 (2006.01) H01L 21/306 (2006.01)
Patent
CA 2328952
The invention relates to highly pure aqueous hydrogen peroxide solutions for the electronics industry and to a method for producing such solutions which are essentially free from organic compounds. The invention is characterized in that, in each case in water, hydrogen and oxygen are catalytically reacted, oxygen is electrochemically reduced or acid ammonium sulfate solutions are electrolyzed. The reactions are carried out in the absence of organic compounds and materials releasing such compounds.
L'invention concerne des solutions de péroxyde d'hydrogène de grande pureté destinées à l'industrie électronique et un procédé de production de telles solutions qui sont sensiblement dépourvues de composés organiques. Ce procédé consiste à faire réagir par voie catalytique de l'eau, de l'hydrogène et de l'oxygène; à réduire électrochimiquement l'oxygène ou à électrolyser des solutions de sulfate d'ammonium. Les réactions s'effectuent en l'absence de composés organiques et de matières libérant ces derniers.
Fischer Martin
Quaiser Stefan
Stammer Achim
Basf Aktiengesellschaft
Borden Ladner Gervais Llp
LandOfFree
Highly pure aqueous hydrogen peroxide solutions, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Highly pure aqueous hydrogen peroxide solutions, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Highly pure aqueous hydrogen peroxide solutions, method for... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1417536