C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 217/62 (2006.01) A61K 9/70 (2006.01) A61K 31/135 (2006.01) A61P 13/00 (2006.01) C07C 213/10 (2006.01)
Patent
CA 2505848
The invention relates to a compound of general formula (I) wherein A represents deuterium or hydrogen, R represents a group selected from C1-6 alkyl, C3-10 cycloalkyl or phenyl, which can be substituted by C1-3 alkoxy, fluorine, chlorine, bromine, iodine, nitro, amino, hydroxyl, oxo, mercapto or deuterium. The C atom marked with a * (star) can be present in an (R) configuration, in an (S)-configuration or a mixture thereof. The invention is characterised in that the above-mentioned compounds are free bases with a degree of purity of more than 97 wt %. The invention also relates to a method for the production of highly pure compounds of general formula (I) and to the use thereof in the production of medicaments.
L'invention concerne un composé de formule (I), dans laquelle A est deutérium ou hydrogène, R désigne un groupe sélectionné parmi alkyle C¿1-6?, cycloalkyle C¿3-10? ou phényle, et pouvant être substitué par alcoxy C1-3, fluor, chlore, brome, iode, nitro, amino, hydroxy, oxo, mercapto ou deutérium, l'atome C marqué de ¿ ?*¿ ?(astérisque) pouvant être en configuration (R), en configuration (S) ou en un mélange des deux. L'invention est caractérisée en ce que le composé est une base libre dont le degré de pureté dépasse 97 % en poids. La présente invention porte également sur un procédé pour réaliser des composés de grande pureté de formule (I) et sur l'utilisation de ces composés de grande pureté dans la production de médicaments.
Breitenbach Armin
Drews Roland
Meese Claus
Wolff Hans-Michael
Robic
Schwarz Pharma Ag
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