Highly sensitive positive photoresist compositions

Details Highly sensitive positive photoresist compositions Highly sensitive positive photoresist compositions

G - Physics

03

F

96/177

G03F 7/039 (2006.01)

Patent

CA 2001384

Abstract Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recur- rent structures having alkaline soluble groups pendant to the polymer backbone, a portion of which groups are substituted with acid labile groups.

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