Hollow electrode plasma excitation source

H - Electricity – 05 – H

Patent

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358/25

H05H 1/24 (2006.01) H01J 49/12 (2006.01) H05H 1/48 (2006.01)

Patent

CA 2001237

ABSTRACT A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures.

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