C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 77/00 (2006.01) C04B 41/45 (2006.01) C08G 77/12 (2006.01) C08L 83/00 (2006.01) C08L 83/04 (2006.01) C09D 183/00 (2006.01) C09D 183/04 (2006.01) H01L 21/312 (2006.01) H01L 21/48 (2006.01)
Patent
CA 2055306
The present invention relates to hydrogen silsesquioxane resin (H-resin) fractions derived from an extraction process using one or more fluids at, near or above their critical state. These fractions can comprise narrow molecular weight fractions with a dispersity less than about 3.0 or fractions useful for applying coatings on substrates. The invention also relates to a method of using these fractions for forming ceramic coatings on substrates.
Gentle Theresa Eileen
Hanneman Larry Frazier
Sharp Kenneth George
Dow Corning Corporation
Gowling Lafleur Henderson Llp
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