C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 220/04 (2006.01) B41N 1/12 (2006.01) B41N 3/03 (2006.01) C08F 220/06 (2006.01) C08F 220/10 (2006.01) C08F 220/34 (2006.01)
Patent
CA 2047483
Abstract of the Disclosure The invention relates to a hydrophilic copolymer having the general structure: Image in which R1 denotes H, CH3 or C2H5, R2 denotes an alkyl or cycloalkyl radical having 1 to 17 carbon atoms, R3 denotes CH3, C2H5 or C3H7, m is 2, 3 or 4 and n, o, p denote the fractions of the monomer units having acidic side groups, neutral, non-ionizable monomer units and monomer units having basic side groups respectively, in mol%, with n + o + p = 100 mol%, with the proviso that n and p are each ? 5 mol%, wherein the copolymer is a linear copolymer having a random structure of monomer units. The copolymer is useful as a hydrophilizing agent for lithographic and offset printing plates.
Faust Raimund J.
Lutz Silvia
Pliefke Engelbert
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
LandOfFree
Hydrophilic copolymers and their use in reprography does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Hydrophilic copolymers and their use in reprography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrophilic copolymers and their use in reprography will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2064932