C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 17/00 (2006.01) A61Q 19/10 (2006.01) C11D 3/12 (2006.01) C11D 3/14 (2006.01) C11D 3/22 (2006.01) C11D 3/37 (2006.01) C11D 3/40 (2006.01) C11D 10/04 (2006.01) C11D 17/06 (2006.01) C11D 1/04 (2006.01) C11D 1/10 (2006.01) C11D 1/12 (2006.01) C11D 1/14 (2006.01) C11D 1/18 (2006.01)
Patent
CA 2642432
The invention relates to both compositions comprising flat platy particles wherein the particles individually have deposition system (i.e., cationic polymers and anionic surfactant) on them.
La présente invention concerne des formules comprenant des particules plates lamellaires, chacune des particules incluant un système déposé à leur surface (c'est-à-dire des polymères cationiques et un tensioactif anionique).
Carnali Joseph Oreste
Moaddel Teanoosh
Patel Rajesh
Polonka Jack
Shafer Georgia
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Plc Unilever
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