C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 220/34 (2006.01) C08F 220/56 (2006.01) C08F 220/58 (2006.01)
Patent
CA 2760734
The invention relates to water-soluble, hydrophobically associating copolymers containing novel hydrophobically associating monomers. The monomers comprise an ethylenically unsaturated group and a polyether group with a block structure consisting of a hydrophilic polyalkylene oxide block, which essentially consists of ethylene oxide groups, and of a terminal, hydrophobic polyalkylene oxide block, which consists of alkylene oxides with at least 4 and preferably at least 5 carbon atoms.
L'invention concerne des copolymères associatifs à groupes hydrophobes, solubles dans l'eau, qui contiennent des monomères associatifs à groupes hydrophobes nouveaux. Ces monomères comprennent un groupe insaturé éthyléniquement de même qu'un groupe polyéther présentant une structure de bloc composée d'un bloc d'oxyde de polyalkylène hydrophile, sensiblement constitué de groupes d'oxyde d'éthylène, et d'un bloc d'oxyde de polyalkylène terminal hydrophobe, constitué d'oxides d'alkylène comportant au moins 4, de préférence au moins 5 atomes de carbone.
Fogel Yulia
Friedrich Stefan
Gaeberlein Peter
Guzmann Marcus
Langlotz Bjoern
Basf Se
Robic
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