C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 317/22 (2006.01) A61K 31/10 (2006.01) A61K 31/18 (2006.01) A61K 31/351 (2006.01) A61K 31/4406 (2006.01) A61K 31/4409 (2006.01) A61K 31/5375 (2006.01) A61K 31/5415 (2006.01) A61P 19/02 (2006.01) A61P 29/00 (2006.01) A61P 43/00 (2006.01) C07D 213/42 (2006.01) C07D 241/04 (2006.01) C07D 265/30 (2006.01) C07D 279/16 (2006.01) C07D 295/18 (2006.01) C07D 295/195 (2006.01) C07D 309/08 (2006.01) C07D 309/14 (2006.01) C07D 405/06 (2006.01)
Patent
CA 2471814
The present invention is directed to a hydroxamic derivative represented by the following general formula (1) having selective matrix metalloproteinases (MMP) inhibitory activity, (see formula 1) wherein R1 and R2 are each independently hydrogen atom, optionally substituted lower alkyl group, or lower haloalkyl group, or R1 and R2 are bound together to form C2~7 straight alkylene group, or a group represented by a formula, -(CH2)m-Y-(CH2)q- (wherein Y is -O-, -NR5-, -S-, -SO-, or -SO2-, m and q are each independently an integer of 1 to 5, and the total of m and q is 2-6, and R5 is hydrogen atom, optionally substituted lower alkyl group, optionally substituted lower alkylcarbonyl group, optionally substituted lower alkoxycarbonyl group, optionally substituted lower alkylsulfonyl group, optionally substituted sulfamoyl group or optionally substituted carbamoyl group), and R4 represent C1-4 lower alkyl group.
L'invention concerne un dérivé d'acide hydroxamique représenté par la formule générale (I), présentant un effet inhibiteur sélectif sur les MMP. Dans la formule (I), R?1¿ et R?2¿ représentent chacun hydrogène, alkyle inférieur, haloalkyle inférieur, etc. ; X représente méthylène ou NR?3¿ (R?3¿ représente hydrogène, alkyle inférieur, etc.) ; et R?4¿ représente alkyle C¿1?-C¿4?.
Dainippon Sumitomo Pharma Co. Ltd.
Kirby Eades Gale Baker
Sumitomo Pharmaceuticals Co. Ltd.
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