C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/273, 260/287
C07D 215/22 (2006.01) C07D 213/68 (2006.01) C07D 215/227 (2006.01) C07D 215/233 (2006.01) C07D 215/26 (2006.01) C07D 215/36 (2006.01) C07D 215/38 (2006.01) C07D 215/40 (2006.01) C07D 215/42 (2006.01) C07D 215/48 (2006.01) C07D 215/50 (2006.01) C07D 215/54 (2006.01) C07D 215/56 (2006.01) C07D 219/06 (2006.01) C07D 221/10 (2006.01) C07D 221/16 (2006.01) C07D 471/04 (2006.01)
Patent
CA 1042892
ABSTRACT OF THE DISCLOSURE Hydroxy quinoline carbamates of the general formula Image wherein one of the radicals R1 and R3 represents a group of formula II Image and the other represents hydrogen, (C1 - C6) alkyl, or (C1 - C4) alkoxy carbonyl; R2 represents hydrogen, (C1 - C6) alkyl, (C1 - C3) alkyl-carbonyl, (C1 - C6) alkoxy carbonyl, or nitro, or R1 and R2 taken together represent a tetramethy- lene group; R4 represents a tetramethylene group or a radical -CH=CH-CH=CH- completing the tetrahydroquinoline or quinoline nucleus, respectively, and which may optionally be substituted by halogen. (C1 - C18) alkyl, (C1 - C3) alkoxy, (C1 - C3) alkylthio, halogen (C1 - C2) alkoxy, trifluoromethyl, (C5 -C7)cycloalkyl, phenoxy, -NH2, di-(C1 - C4) alkylamino, -NO2, (C1 - C3) alkyl carbonyl, or (C1 - C6) alkoxy carbonyl; or R4 represents a radical chosen from: -CH=CH-N=CH-; Image ; Image ; Image ; Image O R Image R5 and R6 represent CH3 or C2H5, and X represents oxygen or sulphur, are val- uable insecticides and particularly aphicides.
215586
Emmel Ludwig
Knauf Werner
Salbeck Gerhard
Studeneer Adolf
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