C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 69/76 (2006.01) C07C 51/29 (2006.01) C07C 51/377 (2006.01) C07C 63/34 (2006.01) C07C 65/11 (2006.01) C07C 67/343 (2006.01) C07C 233/00 (2006.01) C07C 235/66 (2006.01)
Patent
CA 2288199
In one embodiment, the present invention provides a compound comprising formula (I), wherein A = H or OH, X = OH, a halogen, OR, NHR, NR', R'' where R, R', and R'' = H, C1-8alkyl, C2-8alkenyl, or C2-8alkynyl, cycloalkyl, cycloalkenyl, aryl, aralkyl or heterocyclic, substituted or unsubstituted; and R1,R2,R3,R4,R5 = H, C1-8alkyl, C2-8alkenyl, or C2-8alkynyl, cycloalkyl, cycloalkenyl, aryl or heterocyclic, substituted or unsubstituted, wherein R1 includes at least one methylene spacer through which R1 is attached to said compound. The present invention also provides methods for making hydroxynaphthoic acids.
Dans une forme de réalisation cette invention concerne un composé de formule (I). Dans cette formule, A représente H ou OH; X rep résente OH, un halogène, OR, NHR, NR'R'', où R, R' et R'' représentent H, alkyle C¿1-8?, alcényle C¿2-8? ou alkynyle C¿2-8?, cycloalkyle, cycloalcényle, aryle, aralkyle ou groupe hétérocyclique, substitué ou non; et R¿1?,R¿2?,R¿3?,R¿4?,R¿5? représentent H, alkyle C¿1-8?, alcényle C¿2-8?, ou alkynyle C¿2-8?, cycloalkyle, cycloalcényle, aryle, groupe hétérocyclique, substitué ou non substitué, R¿1? comprenant au moins un espaceur méthylène par lequel R¿1? est attaché audit composé. Cette invention concerne également des procédés de production d'acides hydroxynaphtoïques.
Deck Lorraine M.
Royer Robert E.
Vander Jagt David L.
Science & Technology Corporation @ Unm
Smart & Biggar
The University Of New Mexico
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