C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/352, 260/373
C07D 493/10 (2006.01)
Patent
CA 1246590
Abstract Hydroxyphenylpropionic acid ester represented by the structural formula, Image having a novel crystalline structure which, when subjected to Cu-K.alpha. X-ray diffraction, shows sharp X-ray diffraction peaks at angles of diffraction, 2 .theta. = 4.2° and 2 .theta. = 10.6°, has a higher melting point and can be obtained in the form of larger crystals with higher purity than known forms. The compound is a stabilizer for synthetic resins.
511334
Ebina Chinehito
Ishii Tamaki
Okamura Haruki
Sasaki Manji
Yachigo Shinichi
Ridout & Maybee Llp
Sumitomo Chemical Company Limited
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